- puttering targets magnetron sputtering PVD coating High vacuum 2 sputtering targets magnetron sputtering PVD coating machine Leadmed...h vacuum 2 sputtering targets magnetron sputtering PVD coating machine LeadmedApplication:With 2 sputtering targets single sample co-sputtering structure, widely used for composition of many kinds of new material, it can control 2 kinds of material of their conditions including components, temperature, environment and etc, at the same time, it can do preparation of single substance layer, composed layer, single layer, multilayer, ITO thin film, medium film and etc.it is a kind of PVD physical vapor deposition. Technical PerformanceModelJP2-400GVacuum chamber sizeØ400 mm sphereSample injection chambernoVacuum system configurationMolecular pump+ mechanical pump+gate valvePressure limitedBetter than 5×10-5Pa; leak rate ＜1×10-7PaL/SRecover to vacuum state time5×10-4Pa within 30 minutes ( Do pumping by filled with dry nitrogen when system exposed in the air)Magnetron sputtering componentsSputtering target ( negative)2’’ targets;2 standard target;compatible of DC and RF;indirect water cooling connection;Targets with electronic control baffleSputtering power supplyDC500W, 1 set; 1 set RE500W( auto-match)Sample heating platformSample sizeØ50.4mm, with electric control bafflerevolution60 rpmheatingMax. 700℃Negative bias-1000VbaffleElectric baffleGas circuit2 way gas, Ar, N2 or self-election by user;with 2 sets mass flow controllerCooling water nozzle1’’ thread pipeFilm thickness monitornoElectric control systemTouch screen+PLC control systemComponentsSputtering chamber, revolution sample holder, light heating system, gas circuit, pumping system, control system, installation platform. suitable for ultra clean room installation.Power SupplyMax. 5Kw/AC380VFloor Space(mm)L2500xW1200xH2000mmPackingWooden High vacuum 2 sputtering targets magnetron sputtering PVD coating machine LeadmedApplication:With 2 sputtering targets single sample co-sputtering structure, widely used for composition of many kinds of new material, it can control 2 kinds of material of their conditions including components, temperature, environment and etc, at the same time, it can do preparation of single substance layer, composed layer, single layer, multilayer, ITO thin film, medium film and etc.it is a kind of PVD physical vapor deposition. Technical PerformanceModelJP2-400GVacuum chamber sizeØ400 mm sphereSample injection chambernoVacuum system configurationMolecular pump+ mechanical pump+gate valvePressure limitedBetter than 5×10-5Pa; leak rate ＜1×10-7PaL/SRecover to vacuum state time5×10-4Pa within 30 minutes ( Do pumping by filled with dry nitrogen when system exposed in the air)Magnetron sputtering componentsSputtering target ( negative)2’’ targets;2 standard target;compatible of DC and RF;indirect water cooling connection;Targets with electronic control baffleSputtering power supplyDC500W, 1 set; 1 set RE500W( auto-match)Sample heating platformSample sizeØ50.4mm, with electric control bafflerevolution60 rpmheatingMax. 700℃Negative bias-1000VbaffleElectric baffleGas circuit2 way gas, Ar, N2 or self-election by user;with 2 sets mass flow controllerCooling water nozzle1’’ thread pipeFilm thickness monitornoElectric control systemTouch screen+PLC control systemComponentsSputtering chamber, revolution sample holder, light heating system, gas circuit, pumping system, control system, installation platform. suitable for ultra clean room installation.Power SupplyMax. 5Kw/AC380VFloor Space(mm)L2500xW1200xH2000mmPackingWooden ...2018-09-28 15:35:31