Laboratory High vacuum 2 sputtering targets magnetron sputtering PVD coating machine Leadmed
JP2-400G High-vacuum two targets magnetron sputtering coating machine, chamber size ø400mm sphere, with 2 targets single sample co-sputtering structure, widely used for composition of many kinds of new material, it can control 2 kinds of material of their conditions including components, temperature, environment and etc, at the same time, it can do preparation of single substance layer, composed layer, single layer, multilayer, ITO thin film, medium film and etc.
Laboratory High vacuum 2 sputtering targets magnetron sputtering PVD coating machine Leadmed
Application:
With 2 sputtering targets single sample co-sputtering structure, widely used for composition of many kinds of new material,
it can control 2 kinds of material of their conditions including components, temperature, environment and etc,
at the same time, it can do preparation of single substance layer, composed layer, single layer, multilayer, ITO thin film, medium film and etc.
it is a kind of PVD physical vapor deposition.
Technical Performance
Model | |||
Vacuum chamber size | Ø400 mm sphere | ||
Sample injection chamber | no | ||
Vacuum system configuration | Molecular pump+ mechanical pump+gate valve | ||
Pressure limited | Better than 5×10-5Pa; leak rate ＜1×10-7PaL/S | ||
Recover to vacuum state time | 5×10-4Pa within 30 minutes ( Do pumping by filled with dry nitrogen when system exposed in the air) | ||
Magnetron sputtering components | Sputtering target ( negative) | 2’’ targets; 2 standard target; compatible of DC and RF; indirect water cooling connection; Targets with electronic control baffle | |
Sputtering power supply | DC500W, 1 set; 1 set RE500W( auto-match) | ||
Sample heating platform | Sample size | Ø50.4mm, with electric control baffle | |
revolution | 60 rpm | ||
heating | Max. 700℃ | ||
Negative bias | -1000V | ||
baffle | Electric baffle | ||
Gas circuit | 2 way gas, Ar, N2 or self-election by user; with 2 sets mass flow controller | ||
Cooling water nozzle | 1’’ thread pipe | ||
Film thickness monitor | no | ||
Electric control system | Touch screen+PLC control system | ||
Components | Sputtering chamber, revolution sample holder, light heating system, gas circuit, pumping system, control system, installation platform. suitable for ultra clean room installation. | ||
Power Supply | |||
Floor Space(mm) | |||
Packing | Wooden box | ||
TAG: High vacuum 2 sputtering targets magnetron sputtering PVD coating machine Leadmed