Ultra high vacuum 3 sputtering targets magnetron sputtering coating machine Leadmed
JP3-400C Ultra-high vacuum three targets magnetron sputtering coating machine, with 3 targets single sample co-sputtering structure, it can control 3 kinds of material of their technical conditions including components, temperature, environment and etc; It can do preparation of single layer, multilayer, alloy metal film and other kinds of film that can be generated by easily adjustment of their components.
Ultra high vacuum 3 sputtering targets magnetron sputtering coating machine Leadmed
Application:
With 3 sputtering targets single sample co-sputtering structure, it can control 3 kinds of material of their technical conditions including components, temperature, environment and etc;
It can do preparation of single layer, multilayer, alloy metal film and other kinds of film that can be generated by easily adjustment of their components.
cooperated with vacuum glove box to be a complete system;
Technical Performance
Model | ||||
Main sputtering chamber size | Ø400 mm sphere | |||
Process chamber | Ø150×H300 mm, with plasma cleaning function | |||
Vacuum system configuration | Main sputtering chamber | Sputtering ion pump+gate valve | ||
Process chamber | Molecular pump+ mechanical pump+gate valve | |||
Pressure limited | Main sputtering chamber | Better than 5x10-6Pa; leak rate <1x10-7PaL/S | ||
Process chamber | Better than 5×10-5Pa | |||
Recover to vacuum state time | Main sputtering chamber | 1.0×10-5Pa less than 30 minutes ( sample changed finished and then do pumping , vacuum degree is 5.0x10-4Pa ) | ||
Process chamber | 5x10-4Pa less than 30 minutes (Do pumping by filled with dry nitrogen when system exposed in the air) | |||
Magnetron sputtering components | 2’’ targets; 1 strong target, 2 standard targets; compatible of DC, MF and RF; indirect water cooling connection; | |||
DC500W, 2 sets; 1 sets RF500W( auto-match) | ||||
Sample heating platform | Sample size | Ø50mm | ||
revolution | XYZ linear motion +Z rotation, Z spindle: 60 rpm | |||
heating | Max. 700℃ | |||
Negative bias | NO | |||
baffle | Electric baffle | |||
Gas circuit | Molecular pump+ mechanical pump, 3 way gas, Ar, N2, O2 | |||
Cooling water nozzle | 1’’ thread pipe | |||
Film thickness monitor | Frequency resolution 0.03Hz; Speed resolution0.1A/S; Film thickness resolution 0.1A; | |||
Optional components | Sample injection chamber | no | ||
Sample Injection chamber anti-sputtering target | With Plasma cleaning function | |||
Sample Injection chamber annealing furnace | no | |||
Electric control system | Touch screen+PLC control system | |||
Components | Sputtering chamber, revolution sample holder, light heating system, quartz crystal vibration film thickness monitor, gas circuit, pumping system, control system, installation platform. suitable for ultra clean room installation. | |||
Power Supply | Max. 5Kw/AC380V | |||
Floor Space(mm) | ||||
Packing | Wooden box |
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